Home » Accelerators » Applications are now open for XRC Labs Cohort Three

Applications are now open for XRC Labs Cohort Three

XRC Labs, the New York-based accelerator that boasts fashion tech luminary Madison Maxey as an alum, just announced that it’s accepting applications for its third cohort.

In addition to offering courses, workshops, mentoring, VC­ prep sessions and marketing and design-related services, the accelerator invests capital in each of the 10 startups it selects to join the program.

The lab’s programs are hosted on the 5th Avenue campus of Parson’s School of Design in Manhattan as part of its contribution to the program as its founding sponsor. Best Buy, Reebok, TJX, Michael Kors, Intel, Thoughtworks, NRF, RiLA and Shoptalk are some of the lab’s other sponsors.

This year’s program will run from Jan. 3, 2017 to April 10, 2017.

Pano Anthos, XRC Labs founder and managing director said he’s looking forward to building on the momentum from the first and second cohort successes.

“The 2016 cohort class was a dynamic mix of startups in the e-­commerce, retail, design, interactive tech, 3-D printing and smart materials sectors,” he said. “We were not surprised by their rapid impact on the retail marketplace in so many arenas and we look forward to this next cohort class achieving similar success.”

Anthos also said this year’s class will have the added benefit of a 14-week cohort experience, instead of 10 weeks that were previously offered through last year’s program, in addition to more mentorship and workshops.

Companies focusing on omnichannel retail, product development, data science, exploring innovations that address the challenges and opportunities presented by customer loyalty, customer experience, geolocation, 3­-D printing, crowdsourcing, personalization, consumer insights, the Internet of Things and video analytics, are encouraged to apply.

Interested companies can apply until Nov. 7, 2016 can apply for XRC Labs’ Cohort Three via the F6S platform or at www.xrclabs.com

By Ashley Paintsil



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